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secondary electron emission meaning in Chinese

次级电子发射
次生电发射
二次电子发射
二次电子放射

Examples

  1. In this paper based on the theory of the low energy electrons , the movement of the irons in the counter is analyzed . the theories of sputtering and secondary electron emission are discussed respectively . the irons " action and effect on the counter are putted forward
    本文从低能电子发射机理入手,分析了计数管内部离子运动情况,讨论了离子溅射和二次电子发射,提出了离子与计数管内壁相互作用及其对计数管的影响,给出了计数管内壁表面处理仿真图。
  2. The numerical computing methods of the equations involving the static electric - magnetic field , electronic motion in the static electric - magnetic field , and so on are detailed . the methods of the boundary disposal are introduced . the phenomenon of secondary electron emission has also been studied
    介绍了数值计算方法,包括静电磁场的数值计算、在静电静磁场中电子运动轨迹的数值计算、空间电荷密度的数值计算和空间电位分布的数值计算;介绍了边界处理方法。
  3. A new model for the growth stage of surface flashover has been developed according to the experimental results , which is based on the solid band theory . it is suggested that the electron multiplication could be attributed to two processes : one is the secondary electron emission avalanche caused by collisional ionization , the other is the micro - discharge caused by the trap centers of insulator . the trap cente
    电子倍增的过程与材料的表面态直接相关,材料微观结构的变化和材料的表面处理都能够导致材料表面态的变化,引起材料的表面二次电子发射系数以及材料中陷阶密度和分布的改变,从而影响了电子倍增的过程,并进一步改变或影响了沿面闪络的发展过程。
  4. According to secondary electron emission avalanche ( seea ) theory , the effects of insulating materials , shapes , electrode structures of vacuum insulator on surface flashover and its mechanism , design optimization methods for vacuum insulator to improve surface flashover voltage by selecting insulating material , shape and electrode structure are reviewed
    摘要根据二次电子发射崩( seea )理论,综述了真空绝缘子的绝缘介质材料、几何形状和电极结构对绝缘子沿面闪络的影响和机理过程,以及从这三方面优化设计真空绝缘子以提高其沿面闪络电压的方法。
  5. The factors which influenced the process include the insulator ' s material , structure , the distribution of space electrical field , the way to deal with the surface , the characteristic of voltage waveform , pulse width etc . there are two kinds of theory for the vacuum surface flashover : secondary electron emission avalanche ( seea ) and electron triggered polarization relaxation ( etpr )
    影响该过程的因素包括绝缘材料结构、空间电场分布、表面处理方法、所加电压特征,脉冲宽度等。研究真空表面闪络过程有两类理论:二次电子发射崩溃( seea )和电子引发极化松弛( etpr ) 。
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